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FAQ White Paper   EDA   IP Download   1 2 Next   Systematic failure debug and defective pattern extraction for FPGA product yield improvement Anchor Semiconductor, Inc.     Detection of OPC Conflict Edges through MEEF Analysis Anchor Semiconductor, Inc.     A Kernel-Based DfM Model for Process from Layout to Wafer Anchor Semiconductor, Inc.     Hot Spot Management through Design Based Metrology - Measurement and Filtering Anchor Semiconductor, Inc.     Simulation Based Mask Defect Repair Verification and Disposition Anchor Semiconductor, Inc.     Systematic Defect Filtering and Data Analysis Methodology for Design Based Metrology Anchor Semiconductor, Inc.     Design for Manufacturability Guideline Development：Integrated Foundry Approach Anchor Semiconductor, Inc.     Combination of rule and pattern based lithography unfriendly pattern detection in OPC flow Anchor Semiconductor, Inc.     Improvement on OPC completeness through pre-OPC hot spot detection and fix Anchor Semiconductor, Inc.     A Procedure to Back-annotate Process Induced Layout Dimension Changes into the Post Layout Simulation Netlist Anchor Semiconductor, Inc.   1 2 Next

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