NanoScope™ DPE（Design Pattern Explorer）is a unique whole chip design layout database partition, analysis and pattern search tool, a tool in design based pattern-centric yield management and enhancement for advanced technology node IC manufacturing. With proprietary pattern search techniques, NanoScope-DPE is capable to find potential hard-to-process patterns easily for any given IC designs. In addition, the unique whole chip layout pattern partition and pattern signature analysis provide much-needed information in tracking and monitoring the process and yield sensitive patterns/regions.

The DPE reports can directly correlate with many yield-related defect/hotspot inspection and metrology reports in determining yield sensitive patterns, pattern signatures and database regions. Such guided metrology and inspection strategy not only saves time by focusing directly on the most sensitive patterns/regions, but also increases metrology/inspection efficiency with higher chance in catching earlier any process and yield excursions.

Features and Benefits：
　‧　Design layout partitioning and pattern signature analysis. The pattern signature includes pattern（or vertex）　
　　　density, minimal feature（width, space or island）counts, line end types and counts, contact/via counts,
　　　special contact/via property（e.g, single via）, special gate property, multi-layer connectivity.
　‧　Pattern signature based process and yield sensitivity ranking of regions—provide a design knowledge based
　　　guide to target the most sensitive regions for inspection and metrology monitoring
　‧　Pre-defined, parameterized search for yield sensitive patterns related to litho, CMP and other process
　　　modules
　‧　Exact template pattern search with pattern library templates
　‧　Similar template pattern search with pattern library templates; capable utilizing simulation or SEM image
　　　 contours as templates
　‧　Advanced pattern search with user defined topology and CD variations as well as forbidden zone features—
　　　provide a useful guide to locate, track and specifically handle process sensitive patterns, such as complex
　　　2D patterns with multiple line ends.
　‧　Can be operated in both GUI mode and batch mode
　‧　Can be easily integrated with other NanoScope products, like HPA and DPL

DPE GUI with 3 viewing panels（a）：design database loading（left）; layout viewer and filtering page（center）and report loading（right）. The design and report loading panels can be open and close. A layout pattern signature analysis example is shown in（b）. Green areas show zero line end count; while other color areas show different level of line end counts

NanoScope™ DPE operates in 64 bit Linux platform.